Invention Grant
US08969998B2 NAND type nonvolatile semiconductor memory device and method for manufacturing same
有权
NAND型非易失性半导体存储器件及其制造方法
- Patent Title: NAND type nonvolatile semiconductor memory device and method for manufacturing same
- Patent Title (中): NAND型非易失性半导体存储器件及其制造方法
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Application No.: US13225743Application Date: 2011-09-06
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Publication No.: US08969998B2Publication Date: 2015-03-03
- Inventor: Kiyohito Nishihara
- Applicant: Kiyohito Nishihara
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-037223 20110223
- Main IPC: H01L21/70
- IPC: H01L21/70 ; H01L27/115 ; H01L21/762 ; H01L23/485

Abstract:
According to one embodiment, a semiconductor memory device includes a semiconductor substrate, a plurality of element-separating insulators, and contacts. The plurality of element-separating insulators partition the upper layer portion into a plurality of active areas extending in a first direction. The contacts are connected to the active areas. A recess is made in a part in the first direction of an upper surface of each of the active areas. The recess is made across the entire active area in a second direction orthogonal to the first direction. Positions in the first direction of two of the contacts connected respectively to mutually-adjacent active areas are different from each other. One of the contacts is in contact with a side surface of the recess and not in contact with a bottom surface of the recess.
Public/Granted literature
- US20120211861A1 SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2012-08-23
Information query
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