Invention Grant
- Patent Title: In-situ VHF current sensor for a plasma reactor
- Patent Title (中): 用于等离子体反应器的原位VHF电流传感器
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Application No.: US13944026Application Date: 2013-07-17
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Publication No.: US08970226B2Publication Date: 2015-03-03
- Inventor: Hiroji Hanawa , Satoru Kobayashi , Kartik Ramaswamy , Shahid Rauf
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agent Robert M. Wallace
- Main IPC: G01R27/26
- IPC: G01R27/26 ; G01R25/02 ; G01R15/18 ; G01R27/32 ; G01R19/00 ; H05H1/00
Abstract:
An RF current probe is encapsulated in a conductive housing to permit its placement inside a plasma reactor chamber. An RF voltage probe is adapted to have a long coaxial cable to permit a measuring device to be connected remotely from the probe without distorting the voltage measurement.
Public/Granted literature
- US20130320998A1 IN-SITU VHF CURRENT SENSOR FOR A PLASMA REACTOR Public/Granted day:2013-12-05
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