Invention Grant
- Patent Title: Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
- Patent Title (中): 光刻设备，光刻设备和器件制造方法的支撑台
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Application No.: US13586689Application Date: 2012-08-15
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Publication No.: US08970822B2Publication Date: 2015-03-03
- Inventor: Johan Gertrudis Cornelis Kunnen , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus Van Abeelen , Armand Rosa Jozef Dassen , Sander Catharina Reinier Derks
- Applicant: Johan Gertrudis Cornelis Kunnen , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus Van Abeelen , Armand Rosa Jozef Dassen , Sander Catharina Reinier Derks
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/68
Abstract:
A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
Public/Granted literature
- US20130094005A1 SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2013-04-18
Information query
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