Invention Grant
- Patent Title: Defect inspecting apparatus and defect inspecting method
- Patent Title (中): 缺陷检查装置和缺陷检查方法
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Application No.: US14235916Application Date: 2012-05-14
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Publication No.: US08970836B2Publication Date: 2015-03-03
- Inventor: Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Yukihiro Shibata , Toshifumi Honda
- Applicant: Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Yukihiro Shibata , Toshifumi Honda
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2011-166200 20110729
- International Application: PCT/JP2012/003118 WO 20120514
- International Announcement: WO2013/018255 WO 20130207
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/95 ; G01N21/956 ; G01N21/21 ; G01N21/88 ; G01B11/06
Abstract:
An invention being applied is a defect detecting apparatus that has: an illuminating optical system with a laser light source for irradiating a sample on whose surface a pattern is formed with light; a detecting optical system with a sensor for detecting light generated from the sample illuminated by the illuminating optical system; and a signal processing unit that extracts a defect from an image based on the light detected by the detecting optical system, in which an amplification rate of the sensor is dynamically changed during a time when the light is detected by the detecting optical system.
Public/Granted literature
- US20140233024A1 Defect Inspecting Apparatus and Defect Inspecting Method Public/Granted day:2014-08-21
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