Invention Grant
- Patent Title: Apparatuses, systems and methods for treating substrate
- Patent Title (中): 用于处理底物的设备,系统和方法
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Application No.: US13559797Application Date: 2012-07-27
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Publication No.: US08974601B2Publication Date: 2015-03-10
- Inventor: Hyung Joon Kim
- Applicant: Hyung Joon Kim
- Applicant Address: KR Chungcheongnam-do
- Assignee: Semes Co., Ltd.
- Current Assignee: Semes Co., Ltd.
- Current Assignee Address: KR Chungcheongnam-do
- Agency: Carter, DeLuca, Farrell & Schmidt, LLP
- Priority: KR10-2011-0076208 20110729; KR10-2011-0128270 20111202
- Main IPC: C23C16/50
- IPC: C23C16/50 ; C23C16/458 ; H01L21/67

Abstract:
Provided is an apparatus, system and method for treating a substrate, and more particularly, a substrate treating apparatus having a cluster structure, a substrate treating system, and a substrate treating method using the substrate treating system. The substrate treating apparatus includes a load port on which a container containing a substrate is installed, a plurality of process modules treating the substrate, a transfer module disposed between the load port and the process modules, and transferring the substrate between the container and the process modules, and a buffer chamber disposed between neighboring ones of the process modules, and providing a space for carrying the substrate between the neighboring process modules.
Public/Granted literature
- US20130026135A1 APPARATUSES, SYSTEMS AND METHODS FOR TREATING SUBSTRATE Public/Granted day:2013-01-31
Information query
IPC分类: