Invention Grant
- Patent Title: Device and method for treating wafer-shaped articles
- Patent Title (中): 用于处理晶片状物品的装置及方法
-
Application No.: US13307421Application Date: 2011-11-30
-
Publication No.: US08974632B2Publication Date: 2015-03-10
- Inventor: Ulrich Tschinderle , Andreas Gleissner , Michael Brugger
- Applicant: Ulrich Tschinderle , Andreas Gleissner , Michael Brugger
- Applicant Address: AT Villach
- Assignee: Lam Research AG
- Current Assignee: Lam Research AG
- Current Assignee Address: AT Villach
- Agency: Young & Thompson
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23F1/12 ; B05D5/12 ; B08B3/08 ; H01L21/67

Abstract:
A method and device for processing wafer-shaped articles comprises a closed process chamber. A rotary chuck is located within the process chamber, and is adapted to hold a wafer shaped article thereon. An interior fluid distribution ring is positioned above the rotary chuck, and comprises an annular surface inclined downwardly from a radially inner edge to a radially outer edge thereof. At least one fluid distribution nozzle extends into the closed process chamber and is positioned so as to discharge fluid onto the annular surface of the fluid distribution ring.
Public/Granted literature
- US20130134128A1 DEVICE AND METHOD FOR TREATING WAFER-SHAPED ARTICLES Public/Granted day:2013-05-30
Information query
IPC分类: