Invention Grant
- Patent Title: Device for treating gases using surface plasma
- Patent Title (中): 使用表面等离子体处理气体的装置
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Application No.: US14062181Application Date: 2013-10-24
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Publication No.: US08974741B2Publication Date: 2015-03-10
- Inventor: Laurent Bedel , Michel Jouve
- Applicant: Commissariat a l'Energie Atomique et aux Energies Alternatives
- Applicant Address: FR Paris
- Assignee: Commissariat a l'Energie Atomique et aux Energies Alternatives
- Current Assignee: Commissariat a l'Energie Atomique et aux Energies Alternatives
- Current Assignee Address: FR Paris
- Agency: Burr & Brown, PLLC
- Priority: FR1153982 20110510
- Main IPC: B01J19/08
- IPC: B01J19/08 ; B01D53/32 ; B01D53/86

Abstract:
A device for treating gases using surface plasma, including: at least one dielectric substrate having two opposite main surfaces, at least one first electrode, and at least one second electrode being respectively deposited on the two opposite main surfaces of the substrate, the first and second electrodes being connected to the two terminals of an electric power supply source; at least one catalytic support independent from the dielectric substrate and from the electrodes, and integrating a catalyst.
Public/Granted literature
- US20140050631A1 DEVICE FOR TREATING GASES USING SURFACE PLASMA Public/Granted day:2014-02-20
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