Invention Grant
- Patent Title: Method of manufacture of multilayer film
-
Application No.: US13503806Application Date: 2010-10-26
-
Publication No.: US08974872B2Publication Date: 2015-03-10
- Inventor: Akira Hasegawa , Toshiya Kuroda , Takashi Sanada
- Applicant: Akira Hasegawa , Toshiya Kuroda , Takashi Sanada
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JPP2009-250310 20091030
- International Application: PCT/JP2010/069394 WO 20101026
- International Announcement: WO2011/052764 WO 20110505
- Main IPC: H05H1/24
- IPC: H05H1/24 ; C23C16/50 ; C23C14/08 ; C23C14/56 ; H01L51/00 ; H01L51/52 ; C23C16/40 ; C23C16/503 ; C23C16/54

Abstract:
A process for producing a multilayer film which, even when bent, is less apt to decrease in barrier property or electrical conductivity. The process comprises forming a barrier film and a transparent conductive film on a resin film to produce a multilayer film. The barrier film is formed by a plasma enhanced CVD method which uses electric discharge between rolls. The transparent conductive film is preferably formed by physical vapor deposition. The resin film preferably is a polyester resin film or a polyolefin resin film.
Public/Granted literature
- US09011985B2 Method of manufacture of multilayer film Public/Granted day:2015-04-21
Information query
IPC分类: