Invention Grant
- Patent Title: Nanostructured thin film and method for controlling surface properties thereof
- Patent Title (中): 纳米结构薄膜及其表面性质的控制方法
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Application No.: US12237808Application Date: 2008-09-25
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Publication No.: US08974889B2Publication Date: 2015-03-10
- Inventor: Xavier Bulliard , Anass Benayad , Jong Jin Park , Jae Cheol Lee , Yun Hyuk Choi
- Applicant: Xavier Bulliard , Anass Benayad , Jong Jin Park , Jae Cheol Lee , Yun Hyuk Choi
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2008-0066639 20080709
- Main IPC: B32B5/12
- IPC: B32B5/12 ; B82Y30/00 ; C23C16/40
Abstract:
Disclosed herein is a nanostructured thin film. The nanostructured thin film comprises a nanoparticle layer and a number of micro-undulated surfaces formed on the nanoparticle layer. The two micro-undulated structures of the nanostructured thin film are uniformly introduced over a large area. This configuration makes it easy to control the surface properties of the nanostructured thin film. Therefore, the nanostructured thin film can be widely applied to a variety of devices. Also disclosed herein is a method for controlling the surface properties of the nanostructured thin film.
Public/Granted literature
- US20100279066A1 NANOSTRUCTURED THIN FILM AND METHOD FOR CONTROLLING SURFACE PROPERTIES THEREOF Public/Granted day:2010-11-04
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