Invention Grant
- Patent Title: Photoresist compositions and methods of forming photolithographic patterns
- Patent Title (中): 光刻胶组合物和形成光刻图案的方法
-
Application No.: US13407508Application Date: 2012-02-28
-
Publication No.: US08975001B2Publication Date: 2015-03-10
- Inventor: Young Cheol Bae , Rosemary Bell , Thomas Cardolaccia , Seung-Hyun Lee , Yi Liu , Jong Keun Park
- Applicant: Young Cheol Bae , Rosemary Bell , Thomas Cardolaccia , Seung-Hyun Lee , Yi Liu , Jong Keun Park
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronics Materials LLC
- Current Assignee: Rohm and Haas Electronics Materials LLC
- Current Assignee Address: US MA Marlborough
- Agent Jonathan D. Baskin
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/20 ; G03F7/039 ; G03F7/09 ; G03F7/32
Abstract:
Provided are photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
Public/Granted literature
- US20120219901A1 PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS Public/Granted day:2012-08-30
Information query
IPC分类:
