Invention Grant
- Patent Title: Compositions comprising carboxy component and processes for photolithography
- Patent Title (中): 包含羧基组分的组合物和用于光刻的方法
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Application No.: US12592155Application Date: 2009-11-19
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Publication No.: US08975006B2Publication Date: 2015-03-10
- Inventor: Deyan Wang , Charles R. Szmanda , George G. Barclay , Cheng-Bai Xu
- Applicant: Deyan Wang , Charles R. Szmanda , George G. Barclay , Cheng-Bai Xu
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/039 ; G03F7/004 ; G03F7/038
Abstract:
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more block copolymers. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer dining immersion lithography processing.
Public/Granted literature
- US20100173245A1 Compositions comprising carboxy component and processes for photolithography Public/Granted day:2010-07-08
Information query
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