Invention Grant
- Patent Title: Method for manufacturing a MEMS sensor
- Patent Title (中): MEMS传感器的制造方法
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Application No.: US14331182Application Date: 2014-07-14
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Publication No.: US08975090B2Publication Date: 2015-03-10
- Inventor: Goro Nakatani , Toma Fujita
- Applicant: Rohm Co., Ltd.
- Applicant Address: JP Kyoto
- Assignee: Rohm Co., Ltd.
- Current Assignee: Rohm Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Rabin & Berdo, P.C.
- Priority: JP2010-232910 20101015; JP2010-271982 20101206; JP2010-277213 20101213; JP2010-277214 20101213
- Main IPC: H01L21/02
- IPC: H01L21/02 ; B81C1/00

Abstract:
A capacitance type gyro sensor includes a semiconductor substrate, a first electrode integrally including a first base portion and first comb tooth portions and a second electrode integrally including a second base portion and second comb tooth portions, formed by processing the surface portion of the semiconductor substrate. The first electrode has first drive portions that extend from opposed portions opposed to the respective second comb tooth portions on the first base portion toward the respective second comb tooth portions. The second electrode has second drive portions formed on the tip end portions of the respective second comb tooth portions opposed to the respective first drive portions. The first drive portions and the second drive portions engage with each other at an interval like comb teeth.
Public/Granted literature
- US20140322854A1 METHOD FOR MANUFACTURING A MEMS SENSOR Public/Granted day:2014-10-30
Information query
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