Invention Grant
- Patent Title: Method of manufacturing liquid discharge head
- Patent Title (中): 液体排放头的制造方法
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Application No.: US14288206Application Date: 2014-05-27
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Publication No.: US08975097B2Publication Date: 2015-03-10
- Inventor: Masahisa Watanabe , Kenji Fujii , Keisuke Kishimoto , Ryotaro Murakami
- Applicant: Canon Kabushiki Kaisha
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA Inc. IP Division
- Priority: JP2013-136151 20130628
- Main IPC: H01L21/00
- IPC: H01L21/00 ; B41J2/16

Abstract:
A method of manufacturing a liquid discharge head includes: forming a first hole which penetrates through a wafer and becomes at least part of a liquid supply port and a second hole which does not penetrate through the wafer and becomes at least part of a cut-off portion from a front side of the wafer; arranging a dry film on the front side of the wafer; forming a flow passage forming member by heating and developing the dry film; and cutting off the liquid discharge head from the wafer by grinding the wafer from a back side so that the second hole penetrates through the wafer.
Public/Granted literature
- US20150004724A1 METHOD OF MANUFACTURING LIQUID DISCHARGE HEAD Public/Granted day:2015-01-01
Information query
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