Invention Grant
US08975165B2 III-V semiconductor structures with diminished pit defects and methods for forming the same
有权
缺陷凹坑缺陷的III-V半导体结构及其形成方法
- Patent Title: III-V semiconductor structures with diminished pit defects and methods for forming the same
- Patent Title (中): 缺陷凹坑缺陷的III-V半导体结构及其形成方法
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Application No.: US13029213Application Date: 2011-02-17
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Publication No.: US08975165B2Publication Date: 2015-03-10
- Inventor: Christophe Figuet , Ed Lindow , Pierre Tomasini
- Applicant: Christophe Figuet , Ed Lindow , Pierre Tomasini
- Applicant Address: FR Bernin
- Assignee: Soitec
- Current Assignee: Soitec
- Current Assignee Address: FR Bernin
- Agency: TraskBritt
- Main IPC: H01L29/20
- IPC: H01L29/20 ; H01L21/02

Abstract:
Embodiments relate to semiconductor structures and methods of forming them. In some embodiments, the methods may be used to fabricate semiconductor structures of III-V materials, such as InGaN. An In-III-V semiconductor layer is grown with an Indium concentration above a saturation regime by adjusting growth conditions such as a temperature of a growth surface to create a super-saturation regime wherein the In-III-V semiconductor layer will grow with a diminished density of V-pits relative to the saturation regime.
Public/Granted literature
- US20120211870A1 III-V SEMICONDUCTOR STRUCTURES WITH DIMINISHED PIT DEFECTS AND METHODS FOR FORMING THE SAME Public/Granted day:2012-08-23
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