Invention Grant
US08975170B2 Dopant ink compositions for forming doped regions in semiconductor substrates, and methods for fabricating dopant ink compositions
有权
用于在半导体衬底中形成掺杂区的掺杂剂油墨组合物，以及制造掺杂剂油墨组合物的方法
- Patent Title: Dopant ink compositions for forming doped regions in semiconductor substrates, and methods for fabricating dopant ink compositions
- Patent Title (中): 用于在半导体衬底中形成掺杂区的掺杂剂油墨组合物，以及制造掺杂剂油墨组合物的方法
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Application No.: US13280077Application Date: 2011-10-24
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Publication No.: US08975170B2Publication Date: 2015-03-10
- Inventor: Ligui Zhou , Richard A. Spear , Roger Yu-Kwan Leung , Wenya Fan , Helen X. Xu , Lea M. Metin , Anil Shriram Bhanap
- Applicant: Ligui Zhou , Richard A. Spear , Roger Yu-Kwan Leung , Wenya Fan , Helen X. Xu , Lea M. Metin , Anil Shriram Bhanap
- Applicant Address: US NJ Morristown
- Assignee: Honeywell International Inc.
- Current Assignee: Honeywell International Inc.
- Current Assignee Address: US NJ Morristown
- Agency: Ingrassia Fisher & Lorenz PC
- Main IPC: H01L21/22
- IPC: H01L21/22 ; C09D11/03 ; C09D11/38 ; C09D11/52
Abstract:
Dopant ink compositions for forming doped regions in semiconductor substrates and methods for fabricating dopant ink compositions are provided. In an exemplary embodiment, a dopant ink composition comprises a dopant compound including at least one alkyl group bonded to a Group 13 element or a Group 15 element. Further, the dopant ink composition includes a silicon-containing compound.
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