Invention Grant
- Patent Title: Method for manufacturing semiconductor device
- Patent Title (中): 制造半导体器件的方法
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Application No.: US12064511Application Date: 2006-08-22
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Publication No.: US08975192B2Publication Date: 2015-03-10
- Inventor: Yasunori Kojima , Toshiaki Itabashi
- Applicant: Yasunori Kojima , Toshiaki Itabashi
- Applicant Address: JP Tokyo
- Assignee: Hitachi Chemical Dupont Microsystems Ltd.
- Current Assignee: Hitachi Chemical Dupont Microsystems Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Griffin & Szipl, P.C.
- Priority: JP2005-239610 20050822
- International Application: PCT/JP2006/316345 WO 20060822
- International Announcement: WO2007/023773 WO 20070301
- Main IPC: C03C15/00
- IPC: C03C15/00 ; C03C25/68 ; C23F1/00 ; B44C1/22 ; H01L21/302 ; H01L21/461 ; H01L21/56 ; H01L23/31

Abstract:
A method is provided for manufacturing a semiconductor device having a heat-resistant resin film with flip-chip connection structure using a solder bump or a gold bump and an epoxy resin compound laminated thereon, in which adhesiveness is improved particularly after exposure to high temperature and high humidity environments for a long period of time, thereby enhancing the reliability of the semiconductor device. The method, in accordance with the present invention, for manufacturing a semiconductor device having a heat-resistant resin film formed on a semiconductor element and an epoxy resin compound layer laminated thereon, comprises the steps of carrying out a plasma treatment on a surface of the heat-resistant resin film on which the epoxy resin compound layer is laminated using a nitrogen atom-containing gas containing at least one of nitrogen, ammonia, and hydrazine.
Public/Granted literature
- US20090137129A1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE Public/Granted day:2009-05-28
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