Invention Grant
- Patent Title: Substrate for epitaxial growth
- Patent Title (中): 用于外延生长的基板
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Application No.: US13639907Application Date: 2011-03-15
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Publication No.: US08975639B2Publication Date: 2015-03-10
- Inventor: Piotr Perlin , Marcin Sarzyński , Michal Leszczyński , Robert Czernecki , Tadeusz Suski
- Applicant: Piotr Perlin , Marcin Sarzyński , Michal Leszczyński , Robert Czernecki , Tadeusz Suski
- Applicant Address: PL Warsaw
- Assignee: Instytut Wysokich Ciśnień Polskiej Akademi Nauk
- Current Assignee: Instytut Wysokich Ciśnień Polskiej Akademi Nauk
- Current Assignee Address: PL Warsaw
- Agent Horst M. Kasper
- Priority: PL390926 20100406
- International Application: PCT/IB2011/051091 WO 20110315
- International Announcement: WO2011/124997 WO 20111013
- Main IPC: C30B29/40
- IPC: C30B29/40 ; B82Y20/00 ; C30B25/18 ; C30B33/00 ; C30B33/12 ; H01L21/02 ; H01S5/343 ; H01L29/20 ; H01L33/00 ; H01S5/02 ; H01S5/20 ; H01S5/32 ; H01S5/34 ; H01S5/40

Abstract:
A surface of a substrate consists of a plurality of neighboring stripes. Longer edges of the flat surfaces are parallel one to another and planes of these surfaces are disoriented relatively to the crystallographic plane of gallium nitride crystal defined by Miller-Bravais indices (0001), (11-22) or (11-20). The disorientation angle of each of the flat surfaces is between 0 and 3 degrees and is different for each pair of neighboring flat surfaces. The substrate according to the invention allows epitaxial growth of a layered AlInGaN structure by a MOCVD or MBE method which allow to obtain a non-absorbing mirrors laser diode emitting a light in the wavelength from 380 to 550 nm.
Public/Granted literature
- US20130099246A1 SUBSTRATE FOR EPITAXIAL GROWTH Public/Granted day:2013-04-25
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