Invention Grant
US08975682B2 Integrated circuit comprising a capacitor with HSG metal electrodes
有权
集成电路包括具有HSG金属电极的电容器
- Patent Title: Integrated circuit comprising a capacitor with HSG metal electrodes
- Patent Title (中): 集成电路包括具有HSG金属电极的电容器
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Application No.: US12861256Application Date: 2010-08-23
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Publication No.: US08975682B2Publication Date: 2015-03-10
- Inventor: Aomar Halimaoui , Rebha El Farhane , Benoit Froment
- Applicant: Aomar Halimaoui , Rebha El Farhane , Benoit Froment
- Applicant Address: FR Crolles
- Assignee: STMicroelectronics (Crolles 2) SAS
- Current Assignee: STMicroelectronics (Crolles 2) SAS
- Current Assignee Address: FR Crolles
- Agency: Seed IP Law Group PLLC
- Priority: FR0406674 20040618
- Main IPC: H01L29/94
- IPC: H01L29/94 ; H01L27/108 ; H01L49/02

Abstract:
An integrated circuit (IC) includes at least one capacitor with metal electrodes. At least one of the electrodes (10 or 30) is formed from at least surface-silicided hemispherical grain silicon or silicon alloy. A fabrication process for obtaining such a capacitor with silicided metal electrodes is also provided.
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