Invention Grant
US08975694B1 Low resistance power switching device 有权
低电阻功率开关器件

Low resistance power switching device
Abstract:
A semiconductor device includes a semiconductor substrate with doped regions of a first type and doped regions of a second type. A first metallization layer connects to the doped regions of the first type through conductive paths, such that current is able to flow within the metallization layer along a plurality of linear axes. A second metallization layer connects to the doped regions of the second type through conductive paths, such that that current is able to flow within the metallization layer along a plurality of linear axes. Contacts on an exterior surface of the semiconductor device can be arranged concentrically.
Information query
Patent Agency Ranking
0/0