Invention Grant
US08975718B2 Avalanche photodiode-type semiconductor structure with low response time and process for producing such a structure
有权
具有低响应时间的雪崩光电二极管型半导体结构和用于制造这种结构的工艺
- Patent Title: Avalanche photodiode-type semiconductor structure with low response time and process for producing such a structure
- Patent Title (中): 具有低响应时间的雪崩光电二极管型半导体结构和用于制造这种结构的工艺
-
Application No.: US14143425Application Date: 2013-12-30
-
Publication No.: US08975718B2Publication Date: 2015-03-10
- Inventor: Johan Rothman
- Applicant: Commissariat a l'Energie atomique et aux Ene Alt
- Applicant Address: FR Paris
- Assignee: Commissariat a l'energie atomique et aux energies alternatives
- Current Assignee: Commissariat a l'energie atomique et aux energies alternatives
- Current Assignee Address: FR Paris
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: FR1262993 20121231
- Main IPC: H01L31/10
- IPC: H01L31/10 ; H01L31/0296 ; H01L31/103 ; H01L31/107 ; H01L31/18

Abstract:
The invention relates to an avalanche photodiode-type semiconductor structure (1) intended to receive electromagnetic radiation in a given wavelength. The structure comprises a first semiconductor zone (210) with a first type of conductivity with a first longitudinal face (201), said first zone (210) being made of mercury-cadmium telluride of the CdxHg1-xTe type with a cadmium proportion x that is varied. The structure (1) also comprises at least one second semiconductor zone (310) in contact with the first zone (210), and a third semiconductor zone (410) in contact with the second zone (310). The first zone (210) comprises a doping element, such as arsenic, of which the concentration is varied alternately in a direction substantially perpendicular to the first longitudinal face (201) between a so-called low concentration and a so-called high concentration. The invention also relates to a process for producing a structure (1) according to the invention.
Public/Granted literature
Information query
IPC分类: