Invention Grant
- Patent Title: Memory cell having an integrated two-terminal current limiting resistor
- Patent Title (中): 具有集成的两端限流电阻的存储单元
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Application No.: US13721310Application Date: 2012-12-20
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Publication No.: US08975727B2Publication Date: 2015-03-10
- Inventor: Yun Wang , Tony P. Chiang , Imran Hashim , Tim Minvielle , Dipankar Pramanik , Takeshi Yamaguchi
- Applicant: Intermolecular Inc. , Kabushiki Kaisha Toshiba , SanDisk 3D LLC
- Applicant Address: US CA San Jose JP Tokyo US CA Milpitas
- Assignee: Intermolecular, Inc.,Kabushiki Kaisha Toshiba,SanDisk 3D LLC
- Current Assignee: Intermolecular, Inc.,Kabushiki Kaisha Toshiba,SanDisk 3D LLC
- Current Assignee Address: US CA San Jose JP Tokyo US CA Milpitas
- Main IPC: H01L29/8605
- IPC: H01L29/8605 ; H01L45/00 ; H01L27/24

Abstract:
A resistor structure incorporated into a resistive switching memory cell with improved performance and lifetime is provided. The resistor structure may be a two-terminal structure designed to reduce the maximum current flowing through a memory cell. A method is also provided for making such a memory cell. The method includes depositing a resistor structure and depositing a variable resistance layer of a resistive switching memory cell of the memory cell, where the resistor structure is disposed in series with the variable resistance layer to limit the switching current of the memory cell. The incorporation of the resistor structure is very useful in obtaining desirable levels of switching currents that meet the switching specification of various types of memory cells. The memory cells may be formed as part of a high-capacity nonvolatile memory integrated circuit, which can be used in various electronic devices.
Public/Granted literature
- US20130221315A1 Memory Cell Having an Integrated Two-Terminal Current Limiting Resistor Public/Granted day:2013-08-29
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