Invention Grant
- Patent Title: Wafer inspection interface and wafer inspection apparatus
- Patent Title (中): 晶圆检查界面和晶圆检查装置
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Application No.: US13230161Application Date: 2011-09-12
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Publication No.: US08975904B2Publication Date: 2015-03-10
- Inventor: Hiroshi Yamada
- Applicant: Hiroshi Yamada
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: JP2010-207224 20100915
- Main IPC: G01R31/00
- IPC: G01R31/00 ; G01R31/28

Abstract:
A wafer inspection interface IF comprises a probe card, an adsorption unit configured to adsorb a wafer to the probe card, a wafer adsorption sealing member to which the probe card is adsorbed, and a fixing ring configured to fix the wafer adsorption sealing member to a card holder. The adsorption unit includes an air exhaustion unit, a first air duct whose right end portion is opened in the hermetically closed space and the left end portion is opened at a side of the fixing ring, a second air duct whose right end portion is opened to face an opening of the left end portion of the first air duct and the left end portion is opened to be connected with the air exhaustion unit, and a hole by which the first air duct is in communication with the second air duct.
Public/Granted literature
- US20120062258A1 WAFER INSPECTION INTERFACE AND WAFER INSPECTION APPARATUS Public/Granted day:2012-03-15
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