Invention Grant
- Patent Title: Inspection apparatus
- Patent Title (中): 检验仪器
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Application No.: US14236888Application Date: 2012-08-03
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Publication No.: US08976347B2Publication Date: 2015-03-10
- Inventor: Mizuki Oku , Kei Shimura
- Applicant: Mizuki Oku , Kei Shimura
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2011-169731 20110803
- International Application: PCT/JP2012/069787 WO 20120803
- International Announcement: WO2013/018878 WO 20130207
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/95 ; G01N21/88

Abstract:
Light that is scattered by a defect on a wafer is very weak, and a PMT and an MPPC are used as detection methods for measuring the weak light with high speed and sensitivity. The methods have a function of photoelectronically converting the weak light and multiplying an electron, but have a problem in that a signal light is lost and an S/N ratio is reduced because the quantum efficiency of the photoelectron conversion is as low as 50% or less. Direct light is amplified prior to the photoelectron conversion. The optical amplification is an amplification method in which the signal light and light of pump light are introduced into a rare-earth doped fiber, a stimulated emission is caused, and the signal light is amplified. In the present invention, the optical amplification is used. The amplification factor is changed according to various conditions.
Public/Granted literature
- US20140160470A1 INSPECTION APPARATUS Public/Granted day:2014-06-12
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