Invention Grant
US08977990B2 Exposure monitoring key to determine misalignment between blind and reticle
有权
曝光监测键确定盲区与掩模版之间的偏差
- Patent Title: Exposure monitoring key to determine misalignment between blind and reticle
- Patent Title (中): 曝光监测键确定盲区与掩模版之间的偏差
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Application No.: US13856164Application Date: 2013-04-03
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Publication No.: US08977990B2Publication Date: 2015-03-10
- Inventor: Young-Sik An
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Giheung-Gu, Yongin, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Giheung-Gu, Yongin, Gyeonggi-Do
- Agent Robert E. Bushnell, Esq.
- Priority: KR10-2012-0152504 20121224
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F1/22
Abstract:
A reticle including exposure monitoring keys. The reticle includes an exposure region that is to be exposed to light during an exposure process, and a non-exposure region surrounding the exposure region and not to be exposed to the light. The exposure monitoring keys are disposed across a boundary between the exposure region and the non-exposure region.
Public/Granted literature
- US20140176932A1 RETICLE, EXPOSURE APPARATUS INCLUDING THE SAME, AND EXPOSURE METHOD Public/Granted day:2014-06-26
Information query
