Invention Grant
- Patent Title: Metal base substrate and manufacturing method thereof
- Patent Title (中): 金属基底及其制造方法
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Application No.: US13630049Application Date: 2012-09-28
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Publication No.: US08980028B2Publication Date: 2015-03-17
- Inventor: Yoichi Moriya , Tsuyoshi Katsube , Yuki Takemori , Tetsuo Kanamori , Yasutaka Sugimoto , Takahiro Takada
- Applicant: Murata Manufacturing Co., Ltd.
- Applicant Address: JP Kyoto
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Keating & Bennett, LLP
- Priority: JP2010-076687 20100330
- Main IPC: H01L23/15
- IPC: H01L23/15 ; B32B18/00 ; C04B35/117 ; C04B35/16 ; C04B35/195 ; C04B37/02 ; C23C24/08 ; C23C28/04 ; H01L23/14 ; H01L23/498 ; H05K1/05

Abstract:
In a metal base substrate with a low-temperature sintering ceramic layer located on a copper substrate, bonding reliability is increased between the copper substrate and the low-temperature sintering ceramic layer. A raw laminated body is prepared by stacking, on a surface of a copper substrate, a low-temperature sintering ceramic green layer including a low-temperature sintering ceramic material containing about 10 mol % to about 40 mol % of barium in terms of BaO and about 40 mol % to about 80 mol % of silicon in terms of SiO2, and this raw laminated body is subjected to firing at a temperature at which the low-temperature sintering ceramic green layer is sintered. In the thus obtained metal base substrate, a glass layer composed of Cu—Ba—Si based glass with a thickness of about 1 μm to about 5 μm is formed between the metal substrate and the low-temperature sintering ceramic layer.
Public/Granted literature
- US20130264723A1 METAL BASE SUBSTRATE AND MANUFACTURING METHOD THEREOF Public/Granted day:2013-10-10
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