Invention Grant
US08981866B2 Semiconductor device and method of forming RF balun having reduced capacitive coupling and high CMRR
有权
形成具有降低的电容耦合和高CMRR的RF平衡 - 不平衡变换器的半导体器件和方法
- Patent Title: Semiconductor device and method of forming RF balun having reduced capacitive coupling and high CMRR
- Patent Title (中): 形成具有降低的电容耦合和高CMRR的RF平衡 - 不平衡变换器的半导体器件和方法
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Application No.: US13571068Application Date: 2012-08-09
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Publication No.: US08981866B2Publication Date: 2015-03-17
- Inventor: Robert C. Frye , Kai Liu
- Applicant: Robert C. Frye , Kai Liu
- Applicant Address: SG Singapore
- Assignee: STATS ChipPAC, Ltd.
- Current Assignee: STATS ChipPAC, Ltd.
- Current Assignee Address: SG Singapore
- Agency: Atkins and Associates, P.C.
- Agent Robert D. Atkins
- Main IPC: H03H7/42
- IPC: H03H7/42 ; H01L23/522 ; H01P5/10

Abstract:
A semiconductor device has an RF balun formed over a substrate. The RF balun includes a first conductive trace wound to exhibit inductive properties with a first end coupled to a first terminal of the semiconductor device and second end coupled to a second terminal of the semiconductor device. A first capacitor is coupled between the first and second ends of the first conductive trace. A second conductive trace is wound to exhibit inductive properties with a first end coupled to a third terminal of the semiconductor device and second end coupled to a fourth terminal of the semiconductor device. The first conductive trace is formed completely within the second conductive trace. The first conductive trace and second conductive trace can have an oval, circular, or polygonal shape separated by 50 micrometers. A second capacitor is coupled between the first and second ends of the second conductive trace.
Public/Granted literature
- US20120299151A1 Semiconductor Device and Method of Forming RF Balun having Reduced Capacitive Coupling and High CMRR Public/Granted day:2012-11-29
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