Invention Grant
- Patent Title: Mass damper for semiconductor wafer handling end effector
- Patent Title (中): 用于半导体晶片处理端部执行器的质量阻尼器
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Application No.: US13757489Application Date: 2013-02-01
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Publication No.: US08985935B2Publication Date: 2015-03-24
- Inventor: Mark K. Tan , Nicholas M. Kopec , Richard M. Blank
- Applicant: Novellus Systems, Inc.
- Applicant Address: US CA Fremont
- Assignee: Novellus Systems, Inc.
- Current Assignee: Novellus Systems, Inc.
- Current Assignee Address: US CA Fremont
- Agency: Weaver Austin Villeneuve & Sampson
- Main IPC: B25J19/00
- IPC: B25J19/00 ; F16F7/10 ; B25J18/00 ; B25J15/00 ; F16F15/10 ; B25J11/00 ; H01L21/67 ; H01L21/687
Abstract:
A calibrated mass damper for use with end effectors for semiconductor wafer handling robots is described. The calibrated mass damper reduces vibrational response in an end effector carrying a semiconductor wafer without requiring modification of the end effector structure.
Public/Granted literature
- US20130213169A1 MASS DAMPER FOR SEMICONDUCTOR WAFER HANDLING END EFFECTOR Public/Granted day:2013-08-22
Information query
IPC分类:
