Invention Grant
US08986559B2 Compositions and methods for texturing polycrystalline silicon wafers 有权
用于纹理多晶硅晶片的组合物和方法

Compositions and methods for texturing polycrystalline silicon wafers
Abstract:
Compositions and methods for chemical texturing a surface of a polycrystalline silicon wafer to be used in the manufacture of solar cells provide increased efficiency in the manufacture and operation of solar cells. The compositions and methods disclosed herein include first and second components, wherein the first component is a UKON etch composition, including a hydrofluoric acid/nitric acid mixture and water, while the second component includes a silicon wafer texturing enhancer (SWTE).
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