Invention Grant
- Patent Title: Compositions and methods for texturing polycrystalline silicon wafers
- Patent Title (中): 用于纹理多晶硅晶片的组合物和方法
-
Application No.: US13778856Application Date: 2013-02-27
-
Publication No.: US08986559B2Publication Date: 2015-03-24
- Inventor: Nicolas Hildenbrand , Joannes Theodorus Valentinus Hoogboom , Michiel Scheffer , Raymond Albertus Johannes Ten Broeke
- Applicant: Avantor Performance Materials, Inc.
- Applicant Address: US PA Center Valley
- Assignee: Avantor Performance Materials, Inc.
- Current Assignee: Avantor Performance Materials, Inc.
- Current Assignee Address: US PA Center Valley
- Agency: Hoffmann & Baron, LLP
- Main IPC: B29D11/00
- IPC: B29D11/00 ; C09K13/08 ; H01L31/18 ; C09K13/10 ; H01L31/0236

Abstract:
Compositions and methods for chemical texturing a surface of a polycrystalline silicon wafer to be used in the manufacture of solar cells provide increased efficiency in the manufacture and operation of solar cells. The compositions and methods disclosed herein include first and second components, wherein the first component is a UKON etch composition, including a hydrofluoric acid/nitric acid mixture and water, while the second component includes a silicon wafer texturing enhancer (SWTE).
Public/Granted literature
- US20130224898A1 COMPOSITIONS AND METHODS FOR TEXTURING POLYCRYSTALLINE SILICON WAFERS Public/Granted day:2013-08-29
Information query