Invention Grant
- Patent Title: Method of manufacturing chemical mechanical polishing layers having a window
- Patent Title (中): 制造具有窗口的化学机械抛光层的方法
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Application No.: US13427408Application Date: 2012-03-22
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Publication No.: US08986585B2Publication Date: 2015-03-24
- Inventor: Brian T. Cantrell , Kathleen McHugh , James T. Murnane , George H. McClain , Durron A. Hutt , Robert A. Brady , Christopher A. Young , Jeffrey Borcherdt Miller
- Applicant: Brian T. Cantrell , Kathleen McHugh , James T. Murnane , George H. McClain , Durron A. Hutt , Robert A. Brady , Christopher A. Young , Jeffrey Borcherdt Miller
- Applicant Address: US DE Newark
- Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Current Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Current Assignee Address: US DE Newark
- Agent Thomas S. Deibert
- Main IPC: B24D11/00
- IPC: B24D11/00 ; B24B37/20 ; B24D18/00
Abstract:
A method of manufacturing polishing layers having a window for use in chemical mechanical polishing pads is provided, wherein a plurality of polishing layers having an integral window are derived from a cake, wherein the formation of density defects in the cake and the surface roughness of the polishing layers formed are minimized.
Public/Granted literature
- US20130247477A1 Method Of Manufacturing Chemical Mechanical Polishing Layers Having a Window Public/Granted day:2013-09-26
Information query
