Invention Grant
- Patent Title: Method for manufacturing light emitting diode
- Patent Title (中): 制造发光二极管的方法
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Application No.: US14071668Application Date: 2013-11-05
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Publication No.: US08987025B2Publication Date: 2015-03-24
- Inventor: Chia-Hung Huang , Shih-Cheng Huang , Po-Min Tu , Ya-Wen Lin , Shun-Kuei Yang
- Applicant: Advanced Optoelectronic Technology, Inc.
- Applicant Address: CN Guangdong
- Assignee: Zhongshan Innocloud Intellectual Property Services Co., Ltd.
- Current Assignee: Zhongshan Innocloud Intellectual Property Services Co., Ltd.
- Current Assignee Address: CN Guangdong
- Agency: Novak Druce Connolly Bove + Quigg LLP
- Priority: CN201210559844 20120306
- Main IPC: H01L21/205
- IPC: H01L21/205 ; H01L21/302 ; H01L21/329 ; H01L33/58 ; H01L33/10 ; H01L33/22 ; H01L33/32

Abstract:
A manufacturing method for an LED (light emitting diode) includes following steps: providing a substrate; disposing a transitional layer on the substrate, the transitional layer comprising a planar area with a flat top surface and a patterned area with a rugged top surface; coating an aluminum layer on the transitional layer; using a nitriding process on the aluminum layer to form an AlN material on the transitional layer; disposing an epitaxial layer on the transitional layer and covering the AlN material, the epitaxial layer contacting the planar area and the patterned area of the transitional layer, a plurality of gaps being defined between the epitaxial layer and the slugs of the second part of the AlN material in the patterned area of the transitional layer.
Public/Granted literature
- US20140065745A1 METHOD FOR MANUFACTURING LIGHT EMITTING DIODE Public/Granted day:2014-03-06
Information query
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