Invention Grant
- Patent Title: Method of depositing a film using a turntable apparatus
- Patent Title (中): 使用转盘装置沉积膜的方法
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Application No.: US14108663Application Date: 2013-12-17
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Publication No.: US08987147B2Publication Date: 2015-03-24
- Inventor: Hiroaki Ikegawa , Masahiko Kaminishi , Kosuke Takahashi , Masato Koakutsu , Jun Ogawa
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: IPUSA, PLLC
- Priority: JP2012-279921 20121221; JP2013-237216 20131115
- Main IPC: H01L21/31
- IPC: H01L21/31 ; H01L21/469 ; H01L21/02 ; C23C16/455 ; C23C16/458 ; H01L21/687
Abstract:
A method of depositing a film on substrates using an apparatus including a turntable mounting substrates, first and second process areas above the upper surface of the turntable provided with gas supplying portions, a separation gas supplying portion between the first and second process areas, and a separation area including depositing a first oxide film by rotating the turntable first turns while supplying a first reaction gas, the oxidation gas from the second gas supplying portion, and the separation gas; rotating at least one turn while supplying the separation gas from the first gas supplying portion and the separation gas supplying portion, and the oxidation gas from the second gas supplying portion; and rotating at least second turns to deposit a second oxide film while supplying a second reaction gas from the first gas supplying portion, the oxidation gas from the second gas supplying portion, and the separation gas.
Public/Granted literature
- US20140179121A1 METHOD OF DEPOSITING A FILM Public/Granted day:2014-06-26
Information query
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