Invention Grant
- Patent Title: Optical systems and methods for absorbance modulation
- Patent Title (中): 用于吸光度调制的光学系统和方法
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Application No.: US13103874Application Date: 2011-05-09
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Publication No.: US08994920B1Publication Date: 2015-03-31
- Inventor: Kenneth C. Johnson
- Applicant: Kenneth C. Johnson
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B27/42

Abstract:
Optical radiation patterns at two wavelengths, an “imaging” wavelength and a “masking” wavelength, are superimposed on a photochromic layer, wherein the masking wavelength induces optical absorbance in the layer, allowing the imaging wavelength to transmit only through narrow transmittance zones where the masking-wavelength radiation has an optical null. The patterns are preferably formed as a focal-point array. At each focal point a focused-radiation spot at the imaging wavelength is superimposed with an annular-radiation spot at the masking wavelength. The spots may be generated by an array of microlenses with focal points proximate the layer. (Several novel types of dual-wavelength microlenses are disclosed.) Alternatively, the focused-radiation spots may be generated in separate optical paths for the two wavelengths, and optically combined at the photochromic layer by means of beam-combining and projection optics. The radiation patterns can also comprise full-field images, which are formed by separate photomasks for the two wavelengths.
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