Invention Grant
- Patent Title: Methods and apparatus for sensing a substrate in a chamber
- Patent Title (中): 用于感测室中的衬底的方法和装置
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Application No.: US14146503Application Date: 2014-01-02
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Publication No.: US08994950B2Publication Date: 2015-03-31
- Inventor: Ronald Vern Schauer
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Dugan & Dugan, PC
- Main IPC: G01N21/55
- IPC: G01N21/55 ; H01L21/67

Abstract:
The present invention provides methods, apparatus, and systems of sensing a substrate in a chamber. The invention includes emitting radiation of at least two different wavelengths; directing the emitted radiation of a first wavelength through a view port of a chamber at an interior of the chamber; directing the emitted radiation of a second wavelength through the view port of the chamber at a location of a hole in a blade of a substrate carrier; detecting any of the emitted radiation reflected by the blade, the interior of the chamber, or a substrate on the blade; and determining if a substrate is present on the blade based on the reflected radiation detected. Numerous additional aspects are disclosed.
Public/Granted literature
- US20140139838A1 METHODS AND APPARATUS FOR SENSING A SUBSTRATE IN A CHAMBER Public/Granted day:2014-05-22
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