Invention Grant
US08997568B2 Micromachined gyroscope with detection in the plane of the machined wafer 有权
微机械陀螺仪在机加工晶圆的平面内检测

  • Patent Title: Micromachined gyroscope with detection in the plane of the machined wafer
  • Patent Title (中): 微机械陀螺仪在机加工晶圆的平面内检测
  • Application No.: US13381358
    Application Date: 2010-05-28
  • Publication No.: US08997568B2
    Publication Date: 2015-04-07
  • Inventor: Bertrand Leverrier
  • Applicant: Bertrand Leverrier
  • Applicant Address: FR Neuilly sur Seine
  • Assignee: Thales
  • Current Assignee: Thales
  • Current Assignee Address: FR Neuilly sur Seine
  • Agency: Baker and Hostetler LLP
  • Priority: FR0903189 20090630
  • International Application: PCT/EP2010/057450 WO 20100528
  • International Announcement: WO2011/000644 WO 20110106
  • Main IPC: G01C19/5747
  • IPC: G01C19/5747 G01C19/5719 G01C19/56
Micromachined gyroscope with detection in the plane of the machined wafer
Abstract:
A gyroscope having a vibrating structure, produced by micromachining in a thin planar wafer, the gyroscope including two symmetrical moving assemblies that are coupled by a coupling structure connecting the two assemblies so as to allow mechanical vibration energy to be transferred between them, each moving assembly including a first moving element connected to the coupling structure and able to vibrate with two degrees of freedom in orthogonal directions Ox and Oy of the plane of the wafer, and a second moving element adjacent the first moving element, capable of vibrating only in the Oy direction and connected to the first moving element via linkage element, wherein the linkage element allow the transmission, in phase opposition, to the second moving element of the vibration movement of the first moving element in the Oy direction.
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