Invention Grant
- Patent Title: Method and system for monitoring gas pressure for reference cavity of capacitance diaphragm gauge
- Patent Title (中): 电容式隔膜计参考腔气体压力监测方法及系统
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Application No.: US14155294Application Date: 2014-01-14
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Publication No.: US08997576B2Publication Date: 2015-04-07
- Inventor: David J. Ferran , Robert J. Ferran
- Applicant: Reno Technologies, Inc.
- Applicant Address: US DE Wilmington
- Assignee: Reno Technologies, Inc.
- Current Assignee: Reno Technologies, Inc.
- Current Assignee Address: US DE Wilmington
- Agent Jerry Turner Sewell
- Main IPC: G01L9/12
- IPC: G01L9/12 ; G01L21/34 ; G01L9/00

Abstract:
A system and method detect the presence of an unacceptable quantity of gas molecules in the reference vacuum cavity of a capacitance diaphragm gauge (CDG). An independent pressure transducer has an active portion exposed to the reference vacuum cavity. The transducer includes a ring anode, a cylindrical inner wall surface that forms at least one cathode, and a magnet positioned with respect to the ring anode such that the magnetic flux of the magnet is generally aligned with the central axis of the ring anode. A high voltage source applies a voltage between the ring anode and the cathode. A current sensor senses a magnitude of any current flowing between the ring anode and the cathode via ionized gas molecules. A monitoring unit monitors the magnitude of the current sensed by the current sensor and activates an alarm when the magnitude of the current exceeds an acceptable magnitude.
Public/Granted literature
- US20140202254A1 Integrity Monitor for Reference Cavity of Capacitance Diaphragm Gauge Public/Granted day:2014-07-24
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