Invention Grant
US08998606B2 Apparatus and method utilizing forced convection for uniform thermal treatment of thin film devices
有权
利用强制对流对薄膜装置进行均匀热处理的装置和方法
- Patent Title: Apparatus and method utilizing forced convection for uniform thermal treatment of thin film devices
- Patent Title (中): 利用强制对流对薄膜装置进行均匀热处理的装置和方法
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Application No.: US13343531Application Date: 2012-01-04
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Publication No.: US08998606B2Publication Date: 2015-04-07
- Inventor: Paul Alexander , Steven Aragon
- Applicant: Paul Alexander , Steven Aragon
- Applicant Address: US CA San Jose
- Assignee: Stion Corporation
- Current Assignee: Stion Corporation
- Current Assignee Address: US CA San Jose
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: F27D7/02
- IPC: F27D7/02 ; H01L21/67 ; H01L21/324
Abstract:
An apparatus for uniform reactive thermal treatment of thin-film materials includes a chamber enclosing a tube shaped space filled with a work gas and heaters disposed outside the chamber. The apparatus further includes a loading configuration for subjecting a plurality of planar substrates to the work gas in the tube shaped space. Baffles are disposed above and below the loading configuration.
Public/Granted literature
- US20120237885A1 Apparatus and Method Utilizing Forced Convection for Uniform Thermal Treatment of Thin Film Devices Public/Granted day:2012-09-20
Information query
