Invention Grant
- Patent Title: Method for producing cleaning water for an electronic material
- Patent Title (中): 电子材料清洗用水的制造方法
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Application No.: US12736487Application Date: 2009-03-25
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Publication No.: US08999069B2Publication Date: 2015-04-07
- Inventor: Junichi Ida , Hiroto Tokoshima
- Applicant: Junichi Ida , Hiroto Tokoshima
- Applicant Address: JP Tokyo
- Assignee: Kurita Water Industries Ltd.
- Current Assignee: Kurita Water Industries Ltd.
- Current Assignee Address: JP Tokyo
- Agent Manabu Kanesaka
- Priority: JP2008-106926 20080416
- International Application: PCT/JP2009/055902 WO 20090325
- International Announcement: WO2009/128327 WO 20091022
- Main IPC: C11D11/00
- IPC: C11D11/00 ; C11D7/02 ; C11D3/02 ; H01L21/02
Abstract:
A method for producing cleaning water for an electronic material, includes obtaining oxygen gas and argon gas from air with a PSA oxygen concentration apparatus, dissolving the oxygen gas and argon gas obtained from the PSA oxygen concentration apparatus in pure water or ultrapure water. A concentration of dissolved oxygen is in a range of 8 to 50 mg/L, and a content of dissolved argon gas is in a range of 2 to 50 volume % of a total amount of dissolved oxygen gas and the dissolved argon gas.
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