Invention Grant
US08999104B2 Systems, methods and apparatus for separate plasma source control
有权
用于单独等离子体源控制的系统，方法和装置
- Patent Title: Systems, methods and apparatus for separate plasma source control
- Patent Title (中): 用于单独等离子体源控制的系统，方法和装置
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Application No.: US12852364Application Date: 2010-08-06
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Publication No.: US08999104B2Publication Date: 2015-04-07
- Inventor: Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
- Applicant: Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Martine Penilla Group, LLP
- Main IPC: C23F1/00
- IPC: C23F1/00 ; H01J37/32
Abstract:
A plasma source includes multiple ring plasma chambers, multiple primary windings, multiple ferrites and a control system. Each one of the primary windings is wrapped around an exterior one of the ring plasma chambers. Each one of the plurality of the ring plasma chamber passes through a respective portion of the plurality of ferrites. The control system is coupled to each of the ring plasma chambers. A system and method for generating and using a plasma are also described.
Public/Granted literature
- US20120031876A1 SYSTEMS, METHODS AND APPARATUS FOR SEPARATE PLASMA SOURCE CONTROL Public/Granted day:2012-02-09
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