Invention Grant
- Patent Title: Small-scale fabrication systems and methods
- Patent Title (中): 小型制造系统和方法
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Application No.: US14370107Application Date: 2013-01-04
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Publication No.: US08999105B2Publication Date: 2015-04-07
- Inventor: Marko Loncar , Mikhail D. Lukin , Michael J. Burek , Nathalie de Leon , Brendan Shields
- Applicant: President and Fellows of Harvard College
- Applicant Address: US MA Cambridge
- Assignee: President and Fellows of Harvard College
- Current Assignee: President and Fellows of Harvard College
- Current Assignee Address: US MA Cambridge
- Agency: Occhiuti & Rohlicek LLP
- International Application: PCT/US2013/020322 WO 20130104
- International Announcement: WO2013/147966 WO 20131003
- Main IPC: H05H1/00
- IPC: H05H1/00 ; H01L21/683 ; H01L33/00 ; H01L21/3065 ; G02B6/136 ; H01J37/32 ; H01L21/027 ; H01L21/308 ; H01L29/04 ; H01L29/06 ; G02B6/122

Abstract:
An etch mask is formed on a substrate. The substrate is positioned in an enclosure configured to shield an interior of the enclosure from electromagnetic fields exterior to the enclosure; and the substrate is etched in the enclosure, including removing a portion of the substrate to form a structure having at least a portion that is isolated and/or suspended over the substrate.
Public/Granted literature
- US20140367687A1 SMALL-SCALE FABRICATION SYSTEMS AND METHODS Public/Granted day:2014-12-18
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