Invention Grant
US08999105B2 Small-scale fabrication systems and methods 有权
小型制造系统和方法

Small-scale fabrication systems and methods
Abstract:
An etch mask is formed on a substrate. The substrate is positioned in an enclosure configured to shield an interior of the enclosure from electromagnetic fields exterior to the enclosure; and the substrate is etched in the enclosure, including removing a portion of the substrate to form a structure having at least a portion that is isolated and/or suspended over the substrate.
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