Invention Grant
- Patent Title: Method for manufacturing ridge-type waveguide
- Patent Title (中): 制造脊型波导的方法
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Application No.: US13905157Application Date: 2013-05-30
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Publication No.: US08999181B2Publication Date: 2015-04-07
- Inventor: Hsin-Shun Huang
- Applicant: Hon Hai Precision Industry Co., Ltd.
- Applicant Address: TW New Taipei
- Assignee: Hon Hai Precision Industry Co., Ltd.
- Current Assignee: Hon Hai Precision Industry Co., Ltd.
- Current Assignee Address: TW New Taipei
- Agency: Novak Druce Connolly Bove + Quigg LLP
- Priority: TW101147565A 20121214
- Main IPC: G02B6/10
- IPC: G02B6/10

Abstract:
In a method for manufacturing a ridge-type waveguide, a substrate is provided. An etching resistance stripe is coated on the substrate. The substrate with the etching resistance stripe is subjected to a wet etching process to form a ridge under the etching resistance stripe. The etching resistance stripe is removed. A titanium stripe is then coated onto the ridge and diffused into the ridge to form a waveguide in the ridge by a high temperature diffusing process.
Public/Granted literature
- US20140166614A1 METHOD FOR MANUFACTURING RIDGE-TYPE WAVEGUIDE Public/Granted day:2014-06-19
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