Invention Grant
- Patent Title: Method for manufacturing liquid discharge head
- Patent Title (中): 液体排放头的制造方法
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Application No.: US13921101Application Date: 2013-06-18
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Publication No.: US08999182B2Publication Date: 2015-04-07
- Inventor: Hiroyuki Abo , Keiji Matsumoto
- Applicant: Canon Kabushiki Kaisha
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA Inc. IP Division
- Priority: JP2012-138388 20120620
- Main IPC: G01D15/00
- IPC: G01D15/00 ; B41J2/16

Abstract:
A method for manufacturing a liquid discharge head includes a step of preparing a first substrate having an energy generating element at a front surface side thereof; a step of forming a wall member, which is to become a wall for a liquid flow passage, at the front surface side of the first substrate; a step of forming a mask having an opening on the wall member and forming a second substrate, which is composed of silicon and is to become an orifice plate, on the mask; and a step of forming a liquid supply port in the first substrate and a liquid discharge port in the second substrate by supplying an etchant from a back surface side of the first substrate, the back surface being a surface opposite the front surface.
Public/Granted literature
- US20130341302A1 METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD Public/Granted day:2013-12-26
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