Invention Grant
- Patent Title: Curable composition for imprints, patterning method and pattern
- Patent Title (中): 可印刷的组合物，图案化方法和图案
-
Application No.: US14139971Application Date: 2013-12-24
-
Publication No.: US08999221B2Publication Date: 2015-04-07
- Inventor: Kunihiko Kodama , Kyouhei Sakita , Hiroyuki Yonezawa
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2008-308838 20081203; JP2009-005590 20090114; JP2009-176416 20090729
- Main IPC: B29C35/08
- IPC: B29C35/08 ; C08F2/48 ; C08F220/18 ; C09D4/00
Abstract:
Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising at least one kind of polymerizable monomer selected from the following compounds and a photopolymerization initiator;
Public/Granted literature
- US20140121292A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN Public/Granted day:2014-05-01
Information query
IPC分类:
