Invention Grant
- Patent Title: Method for producing regenerated target
- Patent Title (中): 生产再生靶材的方法
-
Application No.: US13727171Application Date: 2012-12-26
-
Publication No.: US08999227B2Publication Date: 2015-04-07
- Inventor: Toshiya Yamamoto , Takanobu Miyashita , Osamu Itoh
- Applicant: Tanaka Holdings Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Tanaka Holdings Co., Ltd
- Current Assignee: Tanaka Holdings Co., Ltd
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2008-332330 20081226
- Main IPC: B22F3/14
- IPC: B22F3/14 ; B22F7/02 ; C04B35/645 ; C23C14/34

Abstract:
A sintering method with uniaxial pressing includes: a powder filling step of disposing a spent target in an inner space of a frame jig having the inner space piercing in a uniaxial direction, and filling the inner space with a raw material powder for a target to cover an erosion part side of the spent target with the raw material powder for a target, a cushioning-material disposition step of disposing a deformable cushioning material so that the raw material powder for a target with which the inner space has been filled in the powder filling step is sandwiched between the spent target and the deformable cushioning material; and a sintering step of pressing the raw material powder for a target with which the inner space has been filled and the spent target in the uniaxial direction through the cushioning material and sintering them.
Public/Granted literature
- US20130115125A1 METHOD FOR PRODUCING REGENERATED TARGET Public/Granted day:2013-05-09
Information query