Invention Grant
- Patent Title: Nonvolatile memory element and method for manufacturing the same
- Patent Title (中): 非易失性存储元件及其制造方法
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Application No.: US14082237Application Date: 2013-11-18
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Publication No.: US08999808B2Publication Date: 2015-04-07
- Inventor: Satoru Fujii , Takumi Mikawa
- Applicant: Panasonic Corporation
- Applicant Address: JP Osaka
- Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2012-255518 20121121
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01L45/00 ; H01L27/24

Abstract:
A nonvolatile memory element includes a first and a second electrode layers, and a variable resistance layer provided between the first and the second electrode layers and having a resistance value reversibly changing according to application of an electrical pulse, wherein the variable resistance layer includes a first variable resistance layer contacting the first electrode layer and comprising an oxygen-deficient first metal oxide, and a second variable resistance layer contacting the first variable resistance layer and comprising a second metal oxide having a smaller oxygen deficiency than the first metal oxide, and including host layers and an inserted layer between each of adjacent pairs of the host layers, wherein the second metal oxide of the inserted layer has a larger oxygen deficiency than the second metal oxide of the host layer, and the first metal oxide has a larger oxygen deficiency than the second metal oxide of the host layer.
Public/Granted literature
- US20140138599A1 NONVOLATILE MEMORY ELEMENT AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2014-05-22
Information query
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