Invention Grant
US08999822B2 Method for creating semiconductor junctions with reduced contact resistance 有权
用于产生具有降低的接触电阻的半导体结的方法

Method for creating semiconductor junctions with reduced contact resistance
Abstract:
Embodiments of the invention relate generally to creating semiconductor junctions with reduced contact resistance. In one embodiment, the invention provides a method of forming a composition of material, the method comprising: providing at least two populations of semiconducting materials; layering the at least two populations of semiconducting materials to form at least two layers; and consolidating the at least two populations of semiconducting materials, wherein the consolidating creates an electrical connection between the at least two layers.
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