Invention Grant
- Patent Title: Method for manufacturing display device
- Patent Title (中): 显示装置制造方法
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Application No.: US11382420Application Date: 2006-05-09
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Publication No.: US08999836B2Publication Date: 2015-04-07
- Inventor: Yoshiaki Oikawa , Kengo Akimoto
- Applicant: Yoshiaki Oikawa , Kengo Akimoto
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Fish & Richardson P.C.
- Priority: JP2005-141899 20050513
- Main IPC: H01L21/44
- IPC: H01L21/44 ; H05B33/10 ; H01L51/52

Abstract:
It is an object of the present invention to provide a technique for manufacturing a highly reliable display device at low cost with high yield. A first electrode layer is formed by a sputtering method using a gas containing hydrogen or H2O, an electroluminescent layer is formed over the first electrode layer, and a second electrode layer is formed over the electroluminescent layer. According to one aspect of the present invention, a display device is manufactured to include a first electrode layer including indium zinc oxide containing silicon oxide and tungsten oxide, an electroluminescent layer over the first electrode layer, and a second electrode layer over the electroluminescent layer, where the electroluminescent layer includes a layer containing an organic compound and an inorganic compound to be in contact with the first electrode layer.
Public/Granted literature
- US20060255719A1 METHOD FOR MANUFACTURING DISPLAY DEVICE Public/Granted day:2006-11-16
Information query
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