Invention Grant
- Patent Title: Photocleavable sense-antisense complex
- Patent Title (中): 可透光有义反义复合物
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Application No.: US12489434Application Date: 2009-06-23
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Publication No.: US09000142B2Publication Date: 2015-04-07
- Inventor: John A. Zebala
- Applicant: John A. Zebala
- Applicant Address: US WA Auburn
- Assignee: Syntrix Biosystems, Inc.
- Current Assignee: Syntrix Biosystems, Inc.
- Current Assignee Address: US WA Auburn
- Agency: Baker & Hostetler LLP
- Main IPC: C07H21/02
- IPC: C07H21/02 ; C07H21/04 ; C12N13/00 ; C12N15/11

Abstract:
There is disclosed a photocleavable sense-antisense nucleobase polymer complex capable of modulating gene expression comprising an unnatural antisense nucleobase polymer that targets an mRNA, and a photocleavable sense nucleobase polymer noncovalently bound to the antisense nucleobase polymer, wherein the photocleavable sense nucleobase polymer comprises a plurality of nucleobase polymers connected by a photocleavable linkage. There is also disclosed a method for controlling the time and spatial position of gene expression comprising selecting a target mRNA, introducing the photocleavable sense-antisense nucleobase polymer complex into a cell, and selectively irradiating the cell with light.
Public/Granted literature
- US20100105120A1 PHOTOCLEAVABLE SENSE-ANTISENSE COMPLEX Public/Granted day:2010-04-29
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