Invention Grant
- Patent Title: Adsorbent for removing metal compounds and method for same
- Patent Title (中): 用于除去金属化合物的吸附剂及其方法
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Application No.: US13582700Application Date: 2011-03-03
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Publication No.: US09000201B2Publication Date: 2015-04-07
- Inventor: Yoichi Sakata , Haruto Wakabayashi , Kazutaka Yanagita
- Applicant: Yoichi Sakata , Haruto Wakabayashi , Kazutaka Yanagita
- Applicant Address: FR Paris
- Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
- Current Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
- Current Assignee Address: FR Paris
- Agent Patricia E. McQueeney
- International Application: PCT/IB2011/050920 WO 20110303
- International Announcement: WO2011/107966 WO 20110909
- Main IPC: C07F3/00
- IPC: C07F3/00 ; C07F3/06 ; C07F5/00 ; C07F5/06
Abstract:
Disclosed are effective and simple adsorbents and methods of using the adsorbents for removing metal impurities generated during storage, transportation and supply of organometallic compounds. The disclosed adsorbents and methods provide for the easy and effective removal of the metallic impurities or compounds generated from decomposition of the organometallic compound during its transportation, storage, and supply. Namely, the disclosed adsorbents and methods permit the stable supply of a high purity organometallic compound desired in the semiconductor and photovoltaic cell.
Public/Granted literature
- US20130066094A1 ADSORBENT FOR REMOVING METAL COMPOUNDS AND METHOD FOR SAME Public/Granted day:2013-03-14
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