Invention Grant
- Patent Title: Pattern measuring apparatus and computer program
- Patent Title (中): 图案测量仪器和计算机程序
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Application No.: US13263826Application Date: 2010-04-07
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Publication No.: US09000365B2Publication Date: 2015-04-07
- Inventor: Yuzuru Mochizuki , Maki Tanaka , Miki Isawa , Satoru Yamaguchi
- Applicant: Yuzuru Mochizuki , Maki Tanaka , Miki Isawa , Satoru Yamaguchi
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2009-097572 20090414
- International Application: PCT/JP2010/002524 WO 20100407
- International Announcement: WO2010/119641 WO 20101021
- Main IPC: G01N23/00
- IPC: G01N23/00 ; G01B15/04 ; G01B15/00 ; H01L21/66

Abstract:
Provided are a pattern measuring apparatus and a computer program which determine whether a gap formed in a sample (201) is a core gap (211) or a spacer gap (212). The secondary electron profile of the sample (201) is acquired, the feature quantities of the secondary electron profile at the positions of edges (303, 305) are detected, and based on the detected feature quantities, whether each gap adjacent to each of the edges (303, 305) is the core gap (211) or the spacer gap (212) is determined. Furthermore, the waveform profile of the spacer (207) is previously stored, the secondary electron profile of the sample (201) is acquired, a matching degree of the secondary electron profile and the stored waveform profile at the position of each spacer (207) is detected, and based on the detected matching degree, whether the each gap adjacent to each spacer (207) is the core gap (211) or the spacer gap (212) is determined.
Public/Granted literature
- US20120037801A1 PATTERN MEASURING APPARATUS AND COMPUTER PROGRAM Public/Granted day:2012-02-16
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