Invention Grant
- Patent Title: LPP EUV light source and method for producing the same
- Patent Title (中): LPP EUV光源及其制造方法
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Application No.: US13388165Application Date: 2010-08-27
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Publication No.: US09000402B2Publication Date: 2015-04-07
- Inventor: Hajime Kuwabara , Kazuhiko Horioka
- Applicant: Hajime Kuwabara , Kazuhiko Horioka
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: IHI Corporation,Tokyo Institute of Technology
- Current Assignee: IHI Corporation,Tokyo Institute of Technology
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Griffin & Szipl, P.C.
- Priority: JP2009-201433 20090901
- International Application: PCT/JP2010/064557 WO 20100827
- International Announcement: WO2011/027717 WO 20110310
- Main IPC: H05G1/70
- IPC: H05G1/70 ; H05G2/00
Abstract:
An LPP EUV light source includes a vacuum chamber 12 that is maintained in a vacuum environment; a gas jet device 14 that forms a hypersonic steady gas jet 1 of the target substance inside the vacuum chamber so as to be collected; and a laser device 16 that collects and radiates a laser beam 3 to the hypersonic steady gas jet, wherein plasma is produced by exciting the target substance at the light collecting point 2 of the laser beam and EUV light 4 is emitted therefrom.
Public/Granted literature
- US20120145930A1 LLP EUV LIGHT SOURCE AND METHOD FOR PRODUCING THE SAME Public/Granted day:2012-06-14
Information query
